Editorial board

Editor-in-Chief
P Bhattacharya, University of Michigan, Ann Arbor, USA

Associate Editors
U Czarnetzki, Ruhr-Universität-Bochum, Germany
G Margaritondo, Ecole Polytechnique, Lausanne, Switzerland
K O'Grady, University of York, UK

Editorial Board
L J Balk, Bergische Universität, Wuppertal, Germany
A Bogaerts, Universiteit Antwerpen, Belgium
G A D Briggs, University of Oxford, UK
S J Bull, University of Newcastle, UK
S Chiang, University of California, Davis, USA
J Frommer, IBM Almaden Research Center, USA
D Graves, University of California, Berkeley, USA
M Haverlag, Philips Lighting, Eindhoven, Netherlands
B Hillebrands, Technische Universität Kaiserslautern, Germany
Y Hwu, Academia Sinica, Taiwan
C Jagadish, Australian National University, Australia
G M W Kroesen, Eindhoven University of Technology, Netherlands
M J Kushner, University of Michigan, Ann Arbor, USA
J K Lee, POSTECH, South Korea
L J Mawst, University of Wisconsin-Madison, USA
M P Morales, CSIC, Madrid, Spain
E Muñoz, ETSI Telecomunicación-ISOM, Madrid, Spain
A B Murphy, CSIRO Materials Science and Engineering, Lindfield, Australia
Y-k Pu, Tsinghua University, Beijing, China
M S R Rao, Indian Institute of Technology, Chennai, India
G Roosen, Institut d'Optique, Palaiseau, France
C A Ross, Massachusetts Institute of Technology, USA
S Samukawa, Tohoku University, Sendai, Japan
O G Schmidt, IFW Dresden, Germany
P Soukiassian, CEA Saclay, France
M Stack, University of Strathclyde, Glasgow, UK
K Takanashi, Tohoku University, Japan
K J Wahl, Naval Research Laboratory, USA