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Shanghai electron beam ion trap: design and current status

Zhu Xikai et al 2004 J. Phys.: Conf. Ser. 2 65-74   doi: 10.1088/1742-6596/2/1/009  Help

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Zhu Xikai, Jiang Dikui, Guo Panlin, Sheng Shugang, Yan Heping, Gong Peirong, Wang Naxiu, Shi Weiguo, Chen Yonglin, Xu Xiangyi, Feng Shuqing and Zhou Tuantuan
Shanghai Institute of Applied Physics, CAS, Shanghai 201800, China
E-mail: ebit@sinr.ac.cn (Zhu Xikai)

Abstract. A new electron beam ion trap (EBIT) is under constructiin in Shanghai. In this paper we describe the design and the features of this apparatus. Finally the current status of Shanghai EBIT is shown.

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