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Structural properties of Ge/Si(001) nano-islands and AlGaN nanowires by Diffraction Anomalous Fine Structure and Multiwavelength Anomalous Diffraction

N A Katcho et al 2009 J. Phys.: Conf. Ser. 190 012129 (12pp)   doi: 10.1088/1742-6596/190/1/012129  Help

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N A Katcho1, M I Richard2, O Landré3, G Tourbot3, M G Proietti4, H Renevier5, V Favre-Nicolin3, B Daudin3, G Chen6, J J Zhang6 and G Bauer6
1 IQFR-CSIC, Dep. Quim. Inorganica – Universidad Complutense de Madrid, Spain
2 Université Paul Cézanne, IM2NP, UMR CNRS NoC 6242, Faculté des Sciences de St Jérôme, Marseille, France
3 INAC, CEA-Grenoble, France
4 ICMA, Dep. Fisica de la Materia Condensada, CSIC-Universidad de Zaragoza, Spain
5 LMGP, Grenoble INP – Minatec, Grenoble, France
6 Johannes Kepler Universität Linz, Institut für Halbleiter-und Festkörperphysik, Austria
E-mail: hubert.renevier@grenoble-inp.fr

Abstract. In this paper, we show that combining Multiwavelength Anomalous Diffraction (MAD) and Diffraction Anomalous Fine Structure (DAFS) spectroscopy, in grazing incidence geometry, allows to obtain structural properties (strain and composition) of semiconductor nanostructures. We report results obtained on dome-shaped Ge nano-islands grown on Si(001) surfaces and AlGaN nanowires grown on Si(100). It is shown that, in the case of sharp interfaces, MAD alone can not determine the mean Ge content in the region of the substrate-island interface and needs to be combined with Extented-DAFS measurements.

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