Valence-selective XAFS spectroscopy using EuLγ4 emission

doi:10.1088/1742-6596/190/1/012050

Valence-selective XAFS spectroscopy using EuLγ₄ emission

H Hayashi et al 2009 J. Phys.: Conf. Ser. 190 012050 (6pp) doi: 10.1088/1742-6596/190/1/012050

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H Hayashi¹, N Kawamura², M Mizumaki², T Takabatake³, H Imura⁴, K Okamoto⁵ and T Akai⁴
¹ Japan Women's University, 2-8-1, Mejirodai, Bunkyo-ku, Tokyo 112–8681, Japan
² JASRI/SPring-8, 1-1-1 Kouto, Sayo, Hyogo 679–5198, Japan
³ Graduate School of Advanced Science of Matter, Hiroshima University, 1-3-1, Kagamiyama, Higashi-Hiroshima, Hiroshima 739–8530, Japan
⁴ Mitsubishi Chemical Group, Science and Technology Research Center, Inc., 1000 Kamoshida-cho, Aoba-ku, Yokohama 227–8502, Japan
⁵ Mitsubishi Chemical Group, Science and Technology Research Center, Inc., 8-3-1, Chu-o, Ami, Inashiki, Ibaraki 300–0332, Japan
E-mail: hayashih@fcjwu.acjp

Abstract. EuLγ₄ emission spectra show a large chemical shift (~5 eV), depending on the valence state of a compound. The applicability of this emission to valence-selective X-ray absorption fine structure spectroscopy was demonstrated by performing partial fluorescence yield measurements using a 1:1 mixture of EuS and Eu₂O₃ and using valence-fluctuating compounds, such as Eu₃Pd₂₀Ge₆ and BaMgAl₁₀O₁₇:Eu.

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Valence-selective XAFS spectroscopy using EuLγ₄ emission

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