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Microring resonators with enhanced tolerance to fabrication misalignments

Dimitris Alexandropoulos et al 2009 J. Opt. A: Pure Appl. Opt. 11 125401 (6pp)   doi: 10.1088/1464-4258/11/12/125401  Help

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Dimitris Alexandropoulos1, Hercules Simos2, Mihai Kusko3, Dana Cristea3, Dimitris Syvridis2 and Nikos A Vainos1
1 Department of Material Science, University of Patras, University Campus, Rio Patras, GR-26504, Greece
2 Optical Communications Laboratory, Department of Informatics and Telecommunications, University of Athens, Panepistimiopolis, Ilissia, Athens, GR-15784, Greece
3 IMT 126A, Erou Iancu Nicolae street, 077190, Bucharest, Romania
E-mail: dalexa@upatras.gr, simos@di.uoa.gr, mihai.kusko@imt.ro, dsyvridi@di.uoa.gr and vainos@upatras.gr

Abstract. Analysis of a design scheme that relaxes alignment issues is reported. This entails the use of vertically coupled microring resonators (MR). It is shown that an almost flat response of the coupling coefficient to offset values up to 1 µm is feasible by judicious choice of the bus and ring waveguide geometry. The scheme is evaluated using FDTD simulations and its applicability to functional devices is probed via the transfer-matrix method of the transmission characteristics of microring-based filters.

Keywords: microring resonators, fabrication tolerance, microring filters

Print publication: Issue 12 (December 2009)
Received 15 April 2009, accepted for publication 4 August 2009
Published 21 September 2009

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