X-ray absorption fine-structure determination of interfacial polarization in SrTiO3 thin films grown on Si(001)

doi:10.1238/Physica.Topical.115a00620

X-ray absorption fine-structure determination of interfacial polarization in SrTiO₃ thin films grown on Si(001)

J C Woicik et al 2005 Phys. Scr. T115 620-622 doi: 10.1238/Physica.Topical.115a00620

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J C Woicik¹, F S Aguirre-Tostada², A Herrera-Gomez², R Droopad³, Z Yu³, D Schlom⁴, E Karapetrova⁵, P Zschack⁵ and P Pianetta⁶
¹ National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
² CINVESTAV-Quertero, Apartado Postal 1-798, Queretaro, Mexico, 76001
³ Physical Sciences Research Labs, Motorola, 2100 East Elliot Road, Tempe, Arizona 85284, USA
⁴ Materials Science and Engineering, Pennsylvania State University, PA 16802, USA
⁵ Argonne National Laboratory, University of Illinois, APS-UNICAT, Argonne, IL 60439, USA
⁶ Stanford Synchrotron Radiation Laboratory, Stanford, CA 94309, USA
E-mail: woicik@bnl.gov

Abstract. Polarization-dependent x-ray absorption fine structure together with x-ray diffraction have been used to study the local structure in SrTiO₃ thin films grown on Si(001). Our data indicate that an interfacial polarization of the SrTiO₃ layer by the Si substrate results in a tetragonal distortion of the SrTiO₃ unit cell.

Print publication: Issue T115 (2005)
Received 26 June 2003, accepted for publication 8 December 2003

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X-ray absorption fine-structure determination of interfacial polarization in SrTiO₃ thin films grown on Si(001)

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