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Micromachining compatible metal patterning technique using localized decomposition of an organometallic compound by laser irradiation

Eiji Makino et al 1998 J. Micromech. Microeng. 8 177-181   doi: 10.1088/0960-1317/8/3/001  Help

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Eiji Makino and Takayuki Shibata
Division of Electronics and Information Engineering, Graduate School of Engineering, Hokkaido University, Kita 13, Nishi 8, Kita-ku, Sapporo 060-8628, Japan

Abstract. Spin coated palladium acetate film was decomposed locally using argon ion laser irradiation and palladium thin film with a line pattern was formed. We studied the effects of the process parameters, such as laser power density and scan rate, on line pattern features and the basic characteristics of the formed palladium thin film. The film had a fine polycrystalline structure with a grain size of up to 100 nm, and high chemical purity, resulting in a low electrical resistivity of the order of cm. The formed line patterns had a smooth surface and flat features. Their thickness was 12% of that of the coated palladium acetate film. The width of the formed palladium line patterns was 100-200% of the spot size of the laser beam, depending on irradiation conditions, due to thermal conduction. This metal pattern deposition technique is not only very simple and flexible, but is also compatible with micromachining processes, since it is a maskless process and is easy to apply to three dimensional structures.

Print publication: Issue 3 (September 1998)
Received 1 December 1997, accepted for publication 23 January 1998

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