Abstract. In this paper, we describe a simple method for fabricating nano-depth grooves in glass. In our method, the depth of the grooves can be easily controlled at the several tens of nanometers scale for the vertical features by simply applying O₂ plasma in the presence of polytetrafluoroethylene (PTFE). Using atomic force microscopy, we found that (1) the etching rate varies in different types of glasses; (2) the etched glass surface is flat (root-mean-square roughness 1 nm); (3) the etched depth of the glass almost linearly depends on the output power of the plasma equipment; and (4) the etching is influenced by the surface area of PTFE that is exposed to O₂ plasma in the etching chamber. Furthermore, using these nano-depth groove structures, we made nano-depth (60 nm) fluidic channels as a demonstration of micro/nanofabrication. The channels are composed of a silicon substrate and etched glass anodically bonded together. This simple method is a useful technique for the production of nano-depth fluidic channels.

Print publication: Issue 11 (November 2009)
Received 15 March 2009, in final form 10 September 2009
Published 20 October 2009