Abstract. We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.

Print publication: Issue 49 (9 December 2009)
Received 23 September 2009, in final form 26 October 2009
Published 6 November 2009