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Thermal stability of nanostructurally stabilized zirconium oxide

Fereydoon Namavar et al 2007 Nanotechnology 18 415702 (6pp)   doi: 10.1088/0957-4484/18/41/415702  Help

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Fereydoon Namavar1, Gonghua Wang2, Chin Li Cheung2,4, Renat F Sabirianov3, Xiao Cheng Zeng2, Wai Ning Mei3, Jaeil Bai2, Joseph R Brewer2, Hani Haider1 and Kevin L Garvin1
1 Department of Orthopaedic Surgery and Rehabilitation, University of Nebraska Medical Center, Omaha, NE 68198, USA
2 Department of Chemistry and Nebraska Centre for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE 68588, USA
3 Department of Physics, University of Nebraska-Omaha, Omaha, NE 68182, USA
4 Author to whom any correspondence should be addressed
E-mail: ccheung2@unl.edu

Abstract. Nanostructurally stabilized zirconium oxide (NSZ) hard transparent films were produced without chemical stabilizers by the ion beam assisted deposition technique (IBAD). A transmission electron microscopy study of the samples produced below 150 °C revealed that these films are composed of zirconium oxide (ZrO2) nanocrystallites of diameters 7.5 ± 2.3 nm. X-ray and selected-area electron diffraction studies suggested that the as-deposited films are consistent with cubic phase ZrO2. Rutherford backscattering spectroscopy (RBS) indicated the formation of stoichiometric ZrO2. The phase identity of these optically transparent NSZ films was in agreement with cubic ZrO2, as indicated by the matching elastic modulus values from the calculated results for pure cubic zirconium oxide and results of nanoindentation measurements. Upon annealing in air for 1 h, these NSZ films were found to retain most of their room temperature deposited cubic phase x-ray diffraction signature up to 850 °C. Size effect and vacancy stabilization mechanisms and the IBAD technique are discussed to explain the present results.

Print publication: Issue 41 (17 October 2007)
Received 29 May 2007, in final form 27 July 2007
Published 12 September 2007

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