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Sub-10 nanometre fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires

M Remeika et al 2005 Nanotechnology 16 1172-1176   doi: 10.1088/0957-4484/16/8/032  Help

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M Remeika and A Bezryadin
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA
E-mail: bezryadi@uiuc.edu

Abstract. Homogeneous metallic nanowires with diameters below 10 nm are produced by sputter coating suspended DNA molecules and/or carbon nanotubes. A fabrication method is described that allows 'e-beam nanosculpting', i.e. local modification of the shape of nanowires, with a resolution of ~3 nm. The process is performed with a focused electron beam (e-beam) in a transmission electron microscope, under direct visual control. We also demonstrate that e-beam radiation can induce local crystallization of nanowires. This method could be used to fabricate novel electronic devices, e.g. single-electron tunnelling transistors, with dimensions below 10 nm, possibly operating at room temperature.

Print publication: Issue 8 (August 2005)
Received 5 March 2005, in final form 20 April 2005
Published 17 May 2005

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