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Random sequential adsorption: from continuum to lattice and pre-patterned substrates

A Cadilhe et al 2007 J. Phys.: Condens. Matter 19 065124 (12pp)   doi: 10.1088/0953-8984/19/6/065124  Help

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A Cadilhe1, N A M Araújo1 and Vladimir Privman2
1 GCEP-Centro de Física da Universidade do Minho, 4710-057 Braga, Portugal
2 Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699-5721, USA
E-mail: cadilhe@fisica.uminho.pt

Abstract. The random sequential adsorption (RSA) model has served as a paradigm for diverse phenomena in physical chemistry, as well as in other areas such as biology, ecology, and sociology. In the present work, we survey aspects of the RSA model with emphasis on the approach to and properties of jammed states obtained for large times in continuum deposition versus that on lattice substrates, and on pre-patterned surfaces. The latter model has been of recent interest in the context of efforts to use pre-patterning as a tool to improve self-assembly in micro- and nanoscale surface structure engineering.

Print publication: Issue 6 (14 February 2007)
Received 22 October 2006
Published 22 January 2007

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