An X-PEEM using an electron mirror aberration corrector for the study of complex
materials

doi:10.1088/0953-8984/17/16/005

An x-ray photoemission electron microscope using an electron mirror aberration corrector for the study of complex materials

J Feng et al 2005 J. Phys.: Condens. Matter 17 S1339-S1350 doi: 10.1088/0953-8984/17/16/005

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J Feng¹, E Forest², A A MacDowell¹, M Marcus¹, H Padmore¹, S Raoux³, D Robin¹, A Scholl¹, R Schlueter¹, P Schmid¹, J Stöhr⁴, W Wan¹, D H Wei⁵ and Y Wu⁶
¹ Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
² High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0810, Japan
³ IBM, Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
⁴ Stanford Synchrotron Radiation Laboratory, PO Box 20450, Stanford, CA 94309, USA
⁵ NSRRC, 101 Hsin-Ann Road, Hsinchu 30077, Taiwan
⁶ Department of Physics, Duke University, Durham, NC 27708, USA

Abstract. A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed at the advanced light source (ALS). An electron mirror combined with a sophisticated magnetic beam separator is used to provide simultaneous correction of spherical and chromatic aberrations. Installed on an elliptically polarized undulator beamline, PEEM3 will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials.

Print publication: Issue 16 (27 April 2005)
Received and in final form 9 December 2004
Published 8 April 2005

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An x-ray photoemission electron microscope using an electron mirror aberration corrector for the study of complex materials

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