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Multiple ionization of atomic argon irradiated by EUV free-electron laser pulses at 62 nm: evidence of sequential electron strip

K Motomura et al 2009 J. Phys. B: At. Mol. Opt. Phys. 42 221003 (4pp)   doi: 10.1088/0953-4075/42/22/221003  Help

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K Motomura1,2, H Fukuzawa1,2, L Foucar1,2,3, X-J Liu1,2, G Prümper1,2, K Ueda1,2, N Saito2,4, H Iwayama2,5, K Nagaya2,5, H Murakami2,5, M Yao2,5, A Belkacem6, M Nagasono2, A Higashiya2, M Yabashi2, T Ishikawa2, H Ohashi2,7 and H Kimura2,7
1 Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
2 RIKEN, XFEL Project Head Office, Sayo, Hyogo 679-5148, Japan
3 Institut für Kernphysik, Universität Frankfurt, 60486 Frankfurt, Germany
4 National Metrology Institute of Japan, AIST, Tsukuba 305-8568, Japan
5 Department of Physics, Kyoto University, Kyoto 606-8502, Japan
6 Lawrence Berkeley National Laboratory, Chemical Science, Berkely, CA 94720, USA
7 Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan
E-mail: ueda@tagen.tohoku.ac.jp

Abstract. We have investigated multiple ionization of atomic argon by extreme-ultraviolet light pulses (62 nm, 100 fs in width, <2 × 1014 W cm−2) at the free-electron laser facility in Japan, and observed highly charged ions with the charge state up to +6. The measured laser power dependence of the highly charged ions indicates that the multiple ionization proceeds via the sequential stripping of electrons.

Print publication: Issue 22 (28 November 2009)
Received 17 September 2009
Published 5 November 2009

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