journals.iop.org home page electronic journals * User guide   * Site map   | Quick Search:Help  
Semiconductor Science and Technology
Athens/Institutional login
IOP login: Password:   
Create account | Alerts | Contact us
Journals Home | Journals List | EJs Extra | This Journal | Search | Authors | Referees | Librarians | User Options | Help |

The nanoscale analysis of MOSFET switching loss

S C Lee et al 2009 Semicond. Sci. Technol. 24 115015 (6pp)   doi: 10.1088/0268-1242/24/11/115015  Help

   PDF (190 KB) | References

S C Lee and K F Tsang
Department of Electronic Engineering, City University of Hong Kong, Kowloon, Hong Kong
E-mail: 50001281@student.cityu.edu.hk

Abstract. A nanoscale analysis of MOSFET switching loss is presented. A new analytical method based on drift diffusive and quantum transport principles with a non-equilibrium Green's function method is proposed. For the first time, the switching energy in a MOSFET is expressed as a function of the dc bias, operating frequency, dimensions, doping concentration and contact materials. The results provide a remarkable insight into the choice of geometries and materials for transistor designers.

Print publication: Issue 11 (November 2009)
Received 9 March 2009, in final form 31 August 2009
Published 20 October 2009

Bookmark and Share Post to CiteUlike | Post to Connotea | Post to Bibsonomy

 

Find related articles





Article options

Authors & Referees

IOP Journal Archiveeprintweb.org - Your address for E prints
 
Content finder
  Full Search
  Help


  
Setup information is available for Adobe Acrobat.
EndNote, ProCite ® and Reference Manager ® are registered trademarks of ISI Researchsoft.
Copyright © Institute of Physics and IOP Publishing Limited 2009.
Use of this service is subject to compliance with the Terms and Conditions of use. In particular, reselling and systematic downloading of files is prohibited.
Help: Cookies | Data Protection. Privacy policy Disclaimer
 
Bioinspiration and Biomimetics reasearch banner